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Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing

Dhungana, Shailesh, Thuong D Nguyen, Bradley J Nordell, Anthony N Caruso, Michelle M Paquette, Georges Chollon, William A Lanford, Kris Scharfenberger, Danya Jacob, and Sean W King. 2017. “Boron and High-K Dielectrics: Possible Fourth Etch Stop Colors for Multipattern Optical Lithography Processing”. Journal of Vacuum Science & Technology A 35 (2): 021510.