Underlying role of mechanical rigidity and topological constraints in physical sputtering and reactive ion etching of amorphous materials
Bhattarai, Gyanendra, Shailesh Dhungana, Bradley J Nordell, Anthony N Caruso, Michelle M Paquette, William A Lanford, and Sean W King. 2018. “Underlying Role of Mechanical Rigidity and Topological Constraints in Physical Sputtering and Reactive Ion Etching of Amorphous Materials”. Physical Review Materials 2 (5): 055602.