Combinatorial survey of fluorinated plasma etching in the silicon-oxygen-carbon-nitrogen-hydrogen system
Dhungana, Shailesh, Bradley J Nordell, Anthony N Caruso, Michelle M Paquette, William A Lanford, Kris Scharfenberger, Danya Jacob, and Sean W King. 2016. “Combinatorial survey of fluorinated plasma etching in the silicon-oxygen-carbon-nitrogen-hydrogen system”. Journal of Vacuum Science & Technology A 34 (6): 061302.