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A BF3-mediated nitrogen-to-carbon rearrangement of N-protected 2, 3-dihydro-3-hydroxy-1H-benzisoindol-1-ones, and its interception for a facile preparation of 3-substituted benzisoindolones

Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing

Dhungana, Shailesh, Thuong D Nguyen, Bradley J Nordell, Anthony N Caruso, Michelle M Paquette, Georges Chollon, William A Lanford, Kris Scharfenberger, Danya Jacob, and Sean W King. 2017. “Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing”. Journal of Vacuum Science & Technology A 35 (2): 021510.