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A BF3-mediated nitrogen-to-carbon rearrangement of N-protected 2, 3-dihydro-3-hydroxy-1H-benzisoindol-1-ones, and its interception for a facile preparation of 3-substituted benzisoindolones

Publication: Journal Article

Schwan, Adrian L, Petar A Duspara, Michelle M Paquette, and Rod Merrill. 2006. “A BF3-Mediated Nitrogen-to-Carbon Rearrangement of N-Protected 2, 3-Dihydro-3-Hydroxy-1H-Benzisoindol-1-Ones, and Its Interception for a Facile Preparation of 3-Substituted Benzisoindolones”. Synlett 2006 (18): 3115-19.

Valence and conduction band offsets at amorphous hexagonal boron nitride interfaces with silicon network dielectrics

Publication: Journal Article

King, Sean W, Michelle M Paquette, Joseph W Otto, AN Caruso, Justin Brockman, Jeff Bielefeld, Marc French, Markus Kuhn, and Benjamin French. 2014. “Valence and Conduction Band Offsets at Amorphous Hexagonal Boron Nitride Interfaces With Silicon Network Dielectrics”. Applied Physics Letters 104 (10): 102901.

Nuclear reaction analysis for H, Li, Be, B, C, N, O and F with an RBS check

Publication: Journal Article

Lanford, WA, M Parenti, BJ Nordell, MM Paquette, AN Caruso, Miia Mäntymäki, J Hämäläinen, et al. 2016. “Nuclear Reaction Analysis for H, Li, Be, B, C, N, O and F With an RBS Check”. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions With Materials and Atoms 371: 211-15.

Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing

Publication: Journal Article

Dhungana, Shailesh, Thuong D Nguyen, Bradley J Nordell, Anthony N Caruso, Michelle M Paquette, Georges Chollon, William A Lanford, Kris Scharfenberger, Danya Jacob, and Sean W King. 2017. “Boron and High-K Dielectrics: Possible Fourth Etch Stop Colors for Multipattern Optical Lithography Processing”. Journal of Vacuum Science & Technology A 35 (2): 021510.

Amorphous hydrogenated boron carbide low-k dielectric and method of making the same, US patent no. 10,301,719 B1

Publication: Miscellaneous

Paquette, Michelle, Bradley Nordell, Anthony N Caruso, and Sean King. 2019. “Amorphous Hydrogenated Boron Carbide Low-K Dielectric and Method of Making the Same, US Patent No. 10,301,719 B1.”

Mauris felis ante montes rhoncus semper, iaculis nisl facilisis malesuada maecenas

Publication: Journal Article

Fames, Pulvinar, Hasellus Dignissim, Imperdiet Sociosqu, and Dictum Gravida. 2020. “Mauris Felis ante Montes Rhoncus Semper, Iaculis Nisl Facilisis Malesuada Maecenas”. Mauris Felis ante Montes Rhoncus Semper, Iaculis Nisl Facilisis Malesuada Maecenas.

Mauris felis ante montes rhoncus semper, iaculis nisl facilisis malesuada maecenas

Publication: Journal Article

Fames, Pulvinar, Hasellus Dignissim, Imperdiet Sociosqu, and Dictum Gravida. 2019. “Mauris Felis ante Montes Rhoncus Semper, Iaculis Nisl Facilisis Malesuada Maecenas”. Mauris Felis ante Montes Rhoncus Semper, Iaculis Nisl Facilisis Malesuada Maecenas.

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