Dhungana, S.; Nguyen, T. D.; Nordell, B. J.; Caruso, A. N.; Paquette, M. M.; Chollon, G.; Lanford, W. A.; Scharfenberger, K.; Jacob, D.; King, S. W. Boron and High-K Dielectrics: Possible Fourth Etch Stop Colors for Multipattern Optical Lithography Processing. Journal of Vacuum Science & Technology A 2017, 35 (2), 021510.