King, S. W.; Plombon, J.; Bielefeld, J.; Blackwell, J.; Vyas, S.; Chebiam, R.; Naylor, C.; Michalak, D.; Kobrinsky, M.; Gstrein, F.; Metz, M.; Clarke, J.; Thapa, R.; Paquette, M. M.; Vemuri, V.; Strandwitz, N.; Fan, Y.; Orlowski, M. A Selectively Colorful yet Chilly Perspective on the Highs and Lows of Dielectric Materials for CMOS Nanoelectronics. 2020 IEEE International Electron Devices Meeting (IEDM) 2020, 40.1.1-40.1.4.
Publications by Year: 2020
2020
Paquette, M. M.; Caruso, A. N.; Brockman, J.; Bielefeld, J.; Kuhn, M.; King, S. W. Band Offsets at Amorphous Hydrogenated Boron Nitride/High-K Oxide Interfaces from X-Ray Photoelectron Spectroscopy With Charging Effects Analysis. Journal of Vacuum Science & Technology B 2020, 38 (3), 030601.
Gharacheh, M. A.; Im, S.; Johnson, J.; Ortiz, G. C.; Zhu, M.; Oyler, N.; Paquette, M.; Rulis, P.; Sakidja, R.; Hwang, J. Direct Determination of Medium Range Ordering in Amorphous Hydrogenated Boron Carbide for Low-K Dielectric Applications. Microscopy and Microanalysis 2020, 26 (S2), 248-249.
Baishnab, N.; Khadka, R.; Paquette, M. M.; Rulis, P.; Oyler, N. A.; Hwang, J.; Sakidja, R. Role of Generated Free Radicals in Synthesis of Amorphous Hydrogenated Boron Carbide from Orthocarborane Using Argon Bombardment: A ReaxFF Molecular Dynamics Study. Materials Research Express 2020, 6 (12), 126461.