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Valence and conduction band offsets at amorphous hexagonal boron nitride interfaces with silicon network dielectrics

Publication: Journal Article

King, Sean W, Michelle M Paquette, Joseph W Otto, AN Caruso, Justin Brockman, Jeff Bielefeld, Marc French, Markus Kuhn, and Benjamin French. 2014. “Valence and Conduction Band Offsets at Amorphous Hexagonal Boron Nitride Interfaces With Silicon Network Dielectrics”. Applied Physics Letters 104 (10): 102901.

Nuclear reaction analysis for H, Li, Be, B, C, N, O and F with an RBS check

Publication: Journal Article

Lanford, WA, M Parenti, BJ Nordell, MM Paquette, AN Caruso, Miia Mäntymäki, J Hämäläinen, et al. 2016. “Nuclear Reaction Analysis for H, Li, Be, B, C, N, O and F With an RBS Check”. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions With Materials and Atoms 371: 211-15.

Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing

Publication: Journal Article

Dhungana, Shailesh, Thuong D Nguyen, Bradley J Nordell, Anthony N Caruso, Michelle M Paquette, Georges Chollon, William A Lanford, Kris Scharfenberger, Danya Jacob, and Sean W King. 2017. “Boron and High-K Dielectrics: Possible Fourth Etch Stop Colors for Multipattern Optical Lithography Processing”. Journal of Vacuum Science & Technology A 35 (2): 021510.

Amorphous hydrogenated boron carbide low-k dielectric and method of making the same, US patent no. 10,301,719 B1

Publication: Miscellaneous

Paquette, Michelle, Bradley Nordell, Anthony N Caruso, and Sean King. 2019. “Amorphous Hydrogenated Boron Carbide Low-K Dielectric and Method of Making the Same, US Patent No. 10,301,719 B1.”

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August 11, 2020 Turpis cursus in hac habitasse platea dictumst quisque sagittis purus. Semper feugiat nibh sed pulvinar proin gravida hendrerit lectus. Optio vel quisquam nobis molestiae iste. Quia inventore est libero amet ea explicabo. Assumenda eligendi repudiandae autem omnis pariatur quam omnis...

Repellendus Est Minima Laborum

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Qui ut voluptatem voluptatem velit molestias hic ad nihil nostrum.Quis nihil ea veniam labore ducimus velit eos. Natus Eos Sed Maiores In Neque Dolores Et. Minima praesentium repudiandae sed nam qui iusto nulla occaecati tempore. Eos sunt ut repudiandae distinctio. Aspernatur cumque quos ab pariatur...

Modulating short wavelength fluorescence with long wavelength light

Publication: Journal Article

Copley, Graeme, Jason G Gillmore, Jeffrey Crisman, Gerdenis Kodis, Christopher L Gray, Brian R Cherry, Benjamin D Sherman, et al. 2014. “Modulating Short Wavelength Fluorescence With Long Wavelength Light”. Journal of the American Chemical Society 136 (34): 11994-3.

Conquering the Low-k Death Curve: Insulating Boron Carbide Dielectrics with Superior Mechanical Properties

Publication: Journal Article

Nordell, Bradley J, Thuong D Nguyen, Christopher L Keck, Shailesh Dhungana, Anthony N Caruso, William A Lanford, John T Gaskins, et al. 2016. “Conquering the Low-K Death Curve: Insulating Boron Carbide Dielectrics With Superior Mechanical Properties”. Advanced Electronic Materials 2 (7): 1600073.

Influence of topological constraints on ion damage resistance of amorphous hydrogenated silicon carbide

Publication: Journal Article

Su, Qing, Tianyao Wang, Jonathan Gigax, Lin Shao, William A Lanford, Michael Nastasi, Liyi Li, Gyanendra Bhattarai, Michelle M Paquette, and Sean W King. 2019. “Influence of Topological Constraints on Ion Damage Resistance of Amorphous Hydrogenated Silicon Carbide”. Acta Materialia 165: 587-602.