Investigation and review of the thermal, mechanical, electrical, optical, and structural properties of atomic layer deposited high-k dielectrics: Beryllium oxide, aluminum oxide, hafnium oxide, and aluminum nitride

Gaskins, J. T.; Hopkins, P. E.; Merrill, D. R.; Bauers, S. R.; Hadland, E.; Johnson, D. C.; Koh, D.; Yum, J. H.; Banerjee, S.; Nordell, B. J.; Paquette, M. M.; Caruso, A. N.; Lanford, W. A.; Henry, P.; Ross, L. L.; Li, H.; Li, L.; French, M.; Rudolph, A. N.; King, S. W. Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High-K Dielectrics: Beryllium Oxide, Aluminum Oxide, Hafnium Oxide, and Aluminum Nitride. ECS Journal of Solid State Science and Technology 2017, 6 (10), N189-N208.
Last updated on 11/01/2023