Band offsets at amorphous hydrogenated boron nitride/high-k oxide interfaces from x-ray photoelectron spectroscopy with charging effects analysis
Paquette, Michelle M, Anthony N Caruso, Justin Brockman, Jeff Bielefeld, Markus Kuhn, and Sean W King. 2020. “Band Offsets at Amorphous Hydrogenated Boron Nitride/High-K Oxide Interfaces from X-Ray Photoelectron Spectroscopy With Charging Effects Analysis”. Journal of Vacuum Science & Technology B 38 (3): 030601.