Synthesis and optimization of low-pressure chemical vapor deposition-silicon nitride coatings deposited from SiHCl3 and NH3

Cossou, B.; Jacques, S.; egnat, G. C.; King, S. W.; Li, L.; Lanford, W. A.; Bhattarai, G.; Paquette, M.; Chollon, G. Synthesis and optimization of low-pressure chemical vapor deposition-silicon nitride coatings deposited from SiHCl3 and NH3. Thin Solid Films 2019, 681, 47-57.