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Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing

Dhungana, Shailesh, Thuong D Nguyen, Bradley J Nordell, Anthony N Caruso, Michelle M Paquette, Georges Chollon, William A Lanford, Kris Scharfenberger, Danya Jacob, and Sean W King. 2017. “Boron and High-K Dielectrics: Possible Fourth Etch Stop Colors for Multipattern Optical Lithography Processing”. Journal of Vacuum Science & Technology A 35 (2): 021510.

Role of generated free radicals in synthesis of amorphous hydrogenated boron carbide from orthocarborane using argon bombardment: a ReaxFF molecular dynamics study

Baishnab, Nirmal, Rajan Khadka, Michelle M Paquette, Paul Rulis, Nathan A Oyler, Jinwoo Hwang, and Ridwan Sakidja. 2020. “Role of Generated Free Radicals in Synthesis of Amorphous Hydrogenated Boron Carbide from Orthocarborane Using Argon Bombardment: A ReaxFF Molecular Dynamics Study”. Materials Research Express 6 (12): 126461.