Dhungana, S.; Nordell, B. J.; Caruso, A. N.; Paquette, M. M.; Lanford, W. A.; Scharfenberger, K.; Jacob, D.; King, S. W. Combinatorial survey of fluorinated plasma etching in the silicon-oxygen-carbon-nitrogen-hydrogen system. Journal of Vacuum Science & Technology A 2016, 34 (6), 061302.
