Bhattarai, G.; Dhungana, S.; Nordell, B. J.; Caruso, A. N.; Paquette, M. M.; Lanford, W. A.; King, S. W. Underlying Role of Mechanical Rigidity and Topological Constraints in Physical Sputtering and Reactive Ion Etching of Amorphous Materials. Physical Review Materials 2018, 2 (5), 055602.
